Photolithographic method of making microcircuits using glycerine in photoresist stripping solution

ABSTRACT

Following the generation of a pattern in a photoresist layer on a non-metallic wafer and development and rinsing thereof, the wafer is slightly etched and immediately metallized. The developed photoresist portions are softened in a stripper solved in methanol, and the unwanted metallization portions are lifted by boiling the wafer in an acetone-lubricant bath. The same liquid is used for a mild scrubbing followed by spraying the wafer in pure acetone.



